This Bal-Tec SCD005 sputter coater is designed for sample preparation in laboratories and for surface treatment such as deposition of gold and platinum electrodes. The desired coating thickness can be pre-selected using a coating thickness curve and constant sputtering parameters. Areas of application include production of conductive films on SEM specimens, the production of conductive carbon films on samples destined for X-ray microanalysis and many more.
Technical specifications:
Voltage: 220 V
Current: 100VA
Sputter current max 75m/A
Process time adjustable 0 – 99.9 sec
Connection pressure: 1-2 bar
Hose Connection: 6mm
External dimensions (W) x (D) x (H): 48.5 x 53 x 30 cm
Weight: 31 kg
